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Laser-and e-Beam Sub-micron Lithography

Aim: To set-up a laser writing device for sub-micron structuring of thin ferroelectric films and to compare its performance with the e-beam lithography. Approach: High-resolution and accurate laser writing will be performed by combining a precision 3D translation stage and an acousto-optic deflector for the scanning of the laser beam. Impact: The laser writer will enable very high flexibility in design and fabrication of integrated optics builing blocks, such as Mach-Zehnder interferometers and microresonators.

Laser-and e-Beam Sub-micron Lithography Microring with 60 μm diameter and 1.5 μm wide side-coupled waveguide written by a laser beam.

People involved: Koechlin, Poberaj

last change: 2006/04/19 by webmaster
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